Plasma enhanced atomic layer batch processing of aluminum...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2012 Vol. 30; Iss. 1

Plasma enhanced atomic layer batch processing of aluminum doped titanium dioxide

Lehnert, Wolfgang, Ruhl, Guenther, Gschwandtner, Alexander
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Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3670876
File:
PDF, 1.48 MB
english, 2012
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