SiO[sub 2] etching in magnetic neutral loop discharge...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1998 / 5 Vol. 16; Iss. 3

SiO[sub 2] etching in magnetic neutral loop discharge plasma

Chen, W.
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581193
Date:
May, 1998
File:
PDF, 3.05 MB
english, 1998
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