Nucleation of HfO[sub 2] atomic layer deposition films on...

Journal of Applied Physics 2007 Vol. 102; Iss. 3

Nucleation of HfO[sub 2] atomic layer deposition films on chemical oxide and H-terminated Si

Hackley, Justin C., Gougousi, Theodosia, Demaree, J. Derek
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Volume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2764223
File:
PDF, 1.00 MB
english, 2007
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