Thermal stability of a-SiN[sub x]:H films deposited by...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1999 Vol. 17; Iss. 4

Thermal stability of a-SiN[sub x]:H films deposited by plasma electron cyclotron resonance

Martı́nez, F. L., del Prado, A., Bravo, D., López, F., Mártil, I., González-Dı́az, G.
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Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.582110
File:
PDF, 380 KB
english, 1999
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