Performance improvement of amorphous silicon thin-film transistors with SiO2 gate insulator by N2 plasma treatment
Kim, Jeong Hyun, Oh, Eui Yeal, Ahn, Byung Chul, Kim, Donggil, Jang, JinVolume:
64
Year:
1994
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.111009
File:
PDF, 427 KB
english, 1994