Effect of neutral transport on the etch product lifecycle during plasma etching of silicon in chlorine gas
Kiehlbauch, Mark W., Graves, David B.Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1527952
File:
PDF, 1.69 MB
english, 2003