Effect of substrate bias and oxygen partial pressure on...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2014 / 05 Vol. 32; Iss. 3

Effect of substrate bias and oxygen partial pressure on properties of RF magnetron sputtered HfO2 thin films

Maidul Haque, Sk., Sagdeo, Pankaj R., Balaji, Shanmugam, Sridhar, Kalavathi, Kumar, Sanjiv, Bhattacharyya, Debarati, Bhattacharyya, Dibyendu, Sahoo, Naba K.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4825234
Date:
May, 2014
File:
PDF, 1.04 MB
english, 2014
Conversion to is in progress
Conversion to is failed