Structural control of nonequilibrium WSi2.6 thin films by...

Structural control of nonequilibrium WSi2.6 thin films by external stress

Fujimura, Norifumi, Tachibana, Shoji, Ito, Taichiro, Hosokawa, Norio
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Volume:
73
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.353330
File:
PDF, 1.06 MB
english, 1993
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