Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1994 / 11 Vol. 12; Iss. 6
Modeling and simulations of a positive chemically amplified photoresist for x-ray lithography
Krasnoperova, A. A.Volume:
12
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.587571
Date:
November, 1994
File:
PDF, 633 KB
english, 1994