Chemical sputtering of Si related to roughness formation of...

Chemical sputtering of Si related to roughness formation of a Cl-passivated Si surface

Feil, H., Dieleman, J., Garrison, B. J.
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Volume:
74
Year:
1993
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.354909
File:
PDF, 1.31 MB
english, 1993
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