Mechanism of interfacial layer suppression after performing...

Mechanism of interfacial layer suppression after performing surface Al(CH[sub 3])[sub 3] pretreatment during atomic layer deposition of Al[sub 2]O[sub 3]

Xu, Min, Zhang, Chi, Ding, Shi-Jin, Lu, Hong-Liang, Chen, Wei, Sun, Qing-Qing, Zhang, David Wei, Wang, Li-Kang
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Volume:
100
Year:
2006
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2388044
File:
PDF, 479 KB
english, 2006
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