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Physical mechanism of effective work function modulation caused by impurity segregation at Ni silicide/SiO[sub 2] interfaces
Tsuchiya, Yoshinori, Yoshiki, Masahiko, Kinoshita, Atsuhiro, Koyama, Masato, Koga, Junji, Ogawa, Masaki, Zaima, ShigeakiVolume:
102
Year:
2007
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.2817257
File:
PDF, 1.38 MB
english, 2007