Electron-beam-induced diffusion during thin-film depth...

Electron-beam-induced diffusion during thin-film depth profiling

Röll, Klaus, Losch, Wolfgang, Achete, Carlos
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Volume:
50
Year:
1979
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.326433
File:
PDF, 444 KB
english, 1979
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