Selective area deposition of silicon-nitride and...

Selective area deposition of silicon-nitride and silicon-oxide by laser chemical vapor deposition and fabrication of microlenses

Sugimura, Atsuhiko, Fukuda, Yasushi, Hanabusa, Mitsugu
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Volume:
62
Year:
1987
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339324
File:
PDF, 667 KB
english, 1987
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