Abstract: Reticle generation by electron-beam lithography

Journal of Vacuum Science and Technology 1979 / 11 Vol. 16; Iss. 6

Abstract: Reticle generation by electron-beam lithography

Berrian, D. W.
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Volume:
16
Language:
english
Journal:
Journal of Vacuum Science and Technology
DOI:
10.1116/1.570300
Date:
November, 1979
File:
PDF, 270 KB
english, 1979
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