Primary and secondary processes in the 193 nm...

The Journal of Chemical Physics 1998 Vol. 108; Iss. 13

Primary and secondary processes in the 193 nm photodissociation of vinyl chloride

Blank, David A., Sun, Weizhong, Suits, Arthur G., Lee, Yuan T., North, Simon W., Hall, Gregory E.
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Volume:
108
Year:
1998
Language:
english
Journal:
The Journal of Chemical Physics
DOI:
10.1063/1.475930
File:
PDF, 447 KB
english, 1998
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