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Effects of rapid thermal annealing on the properties of HfO2/La2O3 nanolaminate films deposited by plasma enhanced atomic layer deposition
Cao, Duo, Cheng, Xinhong, Zheng, Li, Wang, Zhongjian, Xu, Dawei, Xia, Chao, Shen, Lingyan, Wang, Qian, Yu, Yuehui, Shen, DaShenVolume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4900935
Date:
January, 2015
File:
PDF, 2.70 MB
english, 2015