Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1990 / 5 Vol. 8; Iss. 3
X-ray mask distortion analysis using the boundary element method
Ohki, ShigehisaVolume:
8
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.585042
Date:
May, 1990
File:
PDF, 701 KB
english, 1990