Spatial-phase-locked electron-beam lithography: Initial...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 1993 / 11 Vol. 11; Iss. 6

Spatial-phase-locked electron-beam lithography: Initial test results

Ferrera, Juan
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Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586983
Date:
November, 1993
File:
PDF, 653 KB
english, 1993
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