[IEEE 2007 International Symposium on Semiconductor Manufacturing - Santa Clara, CA, USA (2007.10.15-2007.10.17)] 2007 International Symposium on Semiconductor Manufacturing - Using design based binning to improve defect excursion control for 45nm production
Huang, Crockett, Young, Chris, Liu, Hermes, Tzou, S.F., Tsui, David, Tsai, Alex, Chang, EllisYear:
2007
Language:
english
DOI:
10.1109/issm.2007.4446790
File:
PDF, 1.98 MB
english, 2007