Atomic-Scale Mechanisms for Low-NIEL Dopant-Type Dependent Damage in Si
Beck, M. J., Tsetseris, L., Caussanel, M., Schrimpf, R. D., Fleetwood, D. M., Pantelides, S. T.Volume:
53
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/tns.2006.885383
Date:
December, 2006
File:
PDF, 319 KB
english, 2006