Investigation of etching properties of HfO based high-K...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2004 Vol. 22; Iss. 4

Investigation of etching properties of HfO based high-K dielectrics using inductively coupled plasma

Chen, Jinghao, Yoo, Won Jong, Tan, Zerlinda YL, Wang, Yingqian, Chan, Daniel S.H.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1705590
File:
PDF, 359 KB
english, 2004
Conversion to is in progress
Conversion to is failed