Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor
Yanguas-Gil, Angel, Elam, Jeffrey W.Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3670396
File:
PDF, 850 KB
english, 2012