Simple model for atomic layer deposition precursor reaction...

Simple model for atomic layer deposition precursor reaction and transport in a viscous-flow tubular reactor

Yanguas-Gil, Angel, Elam, Jeffrey W.
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Volume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.3670396
File:
PDF, 850 KB
english, 2012
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