Effects of discharge parameters on deposition rate of...

Journal of Applied Physics 1987 Vol. 62; Iss. 2

Effects of discharge parameters on deposition rate of hydrogenated amorphous silicon for solar cells from pure SiH4 plasma

Ishihara, Shin-ichiro, Kitagawa, Masatoshi, Hirao, Takashi, Wasa, Kiyotaka, Arita, Takashi, Mori, Koshiro
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Volume:
62
Year:
1987
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.339771
File:
PDF, 1.00 MB
english, 1987
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