Development of the sputtering yields of ArF photoresist after the onset of argon ion bombardment
Takeuchi, Takuya, Corbella, Carles, Grosse-Kreul, Simon, von Keudell, Achim, Ishikawa, Kenji, Kondo, Hiroki, Takeda, Keigo, Sekine, Makoto, Hori, MasaruVolume:
113
Year:
2013
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4772996
File:
PDF, 1.61 MB
english, 2013