Growth, structure, and mechanical properties of hydrogenated amorphous carbon nitride films deposited by CH[sub 3]CN dielectric barrier discharges
Niu, Jinhai, Liu, Dongping, Cai, Haibo, Liu, Yang, Cui, SuolinVolume:
107
Year:
2010
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3332115
File:
PDF, 1.02 MB
english, 2010