Very low surface recombination velocity on p-type c-Si by high-rate plasma-deposited aluminum oxide
Saint-Cast, Pierre, Kania, Daniel, Hofmann, Marc, Benick, Jan, Rentsch, Jochen, Preu, RalfVolume:
95
Year:
2009
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3250157
File:
PDF, 417 KB
english, 2009