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Reactor-scale models for rf diode sputtering of metal thin films
Desa, S., Ghosal, S., Kosut, R. L., Ebert, J. L., Abrahamson, T. E., Kozak, A., Zou, D. W., Zhou, X., Groves, J. F., Wadley, H. N. G.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581705
File:
PDF, 913 KB
english, 1999