Quantification of line-edge roughness of photoresists. I. A...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2003 Vol. 21; Iss. 3

Quantification of line-edge roughness of photoresists. I. A comparison between off-line and on-line analysis of top-down scanning electron microscopy images

Patsis, G. P., Constantoudis, V., Tserepi, A., Gogolides, E., Grozev, G.
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Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1570845
File:
PDF, 979 KB
english, 2003
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