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[IEEE 2013 International Conference on Quality, Reliability, Risk, Maintenance, and Safety Engineering (QR2MSE) - Chengdu, China (2013.07.15-2013.07.18)] 2013 International Conference on Quality, Reliability, Risk, Maintenance, and Safety Engineering (QR2MSE) - Dynamic error analysis for six degrees of freedom micro-displacement mechanism in reticle stage of lithography machine
Luo, Dashuang, Wang, Kesheng, Zhang, Longlong, Li, Jing, Huang, Hong-Zhong, Liu, YuYear:
2013
Language:
english
DOI:
10.1109/qr2mse.2013.6625639
File:
PDF, 2.33 MB
english, 2013