Removing imperceptible fluoride residue after chemical...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2011 Vol. 29; Iss. 5

Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

Futase, Takuya, Tanioto, Hisanori, Kimoto, Mitsuo, Tsugane, Hideaki, Suzuki, Hidenori, Tobimatsu, Hiroshi
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
29
Year:
2011
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3622301
File:
PDF, 1.13 MB
english, 2011
Conversion to is in progress
Conversion to is failed