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[IEEE International Symposium on Electromagnetic Compatibility - Beijing, China (21-24 May 2002)] 2002 3rd International Symposium on Electromagnetic Compatibility - ULF emission induced by tension and shear cracks
Kulchitsky, A.V., Molchanov, O.A., Hayakawa, M.Year:
2002
Language:
english
DOI:
10.1109/elmagc.2002.1177347
File:
PDF, 207 KB
english, 2002