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Photochemical vapor deposition of amorphous silica films using disilane and perfluorosilanes: Defect structures and deposition mechanism
Nonaka, Hidehiko, Arai, Kazuo, Fujino, Yoshiyuki, Ichimura, ShingoVolume:
64
Year:
1988
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.341330
File:
PDF, 1.03 MB
english, 1988