Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1988 / 5 Vol. 6; Iss. 3
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Planar vias through Si3N4 fabricated by focused ion beam implantation
Melngailis, JohnVolume:
6
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.584340
Date:
May, 1988
File:
PDF, 620 KB
english, 1988