Effect of O2 gas partial pressure on mechanical properties of Al2O3 films deposited by inductively coupled plasma-assisted radio frequency magnetron sputtering
Fujiyama, Hirokazu, Sumomogi, Tsunetaka, Nakamura, MasayoshiVolume:
30
Year:
2012
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4746013
File:
PDF, 2.18 MB
english, 2012