Analytical modeling of silicon etch process in high density...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 1999 Vol. 17; Iss. 5

Analytical modeling of silicon etch process in high density plasma

Abdollahi-Alibeik, Shahram, McVittie, James P., Saraswat, Krishna C., Sukharev, Valeriy, Schoenborn, Philippe
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Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581986
File:
PDF, 785 KB
english, 1999
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