Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
1993 / 3 Vol. 11; Iss. 2
Silicon dioxide trench filling process in a radio-frequency hollow cathode reactor
Gross, M.Volume:
11
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.586664
Date:
March, 1993
File:
PDF, 1.03 MB
english, 1993