Behavior of Metal-Doped Silica Thin Films with...

Behavior of Metal-Doped Silica Thin Films with Artificial-Lattice Structure A: Electro-Mechanical Properties

Uno, Takehiko, Noge, Satoru, Shimotori, Hirotaka, Fujitsuka, Shun
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Volume:
338
Language:
english
Journal:
Ferroelectrics
DOI:
10.1080/00150190600740267
Date:
August, 2006
File:
PDF, 644 KB
english, 2006
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