[IEEE 2007 Digest of papers Microprocesses and Nanotechnology - Kyoto, Japan (2007.11.5-2007.11.8)] 2007 Digest of papers Microprocesses and Nanotechnology - Photoelectron trajectory simulation in a resist for EUV lithography
Kotera, Masatoshi, Yagura, Kei, Maekawa, Takeshi, Kawano, Daichi, Tanaka, HiroyukiYear:
2007
Language:
english
DOI:
10.1109/imnc.2007.4456121
File:
PDF, 790 KB
english, 2007