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[IEEE 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. - San Jose, CA, USA (8-10 Oct. 2001)] 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203) - Novel approach for precise control of oxide thickness
Saki, K., Kawase, S., Shiozawa, J., Yamamoto, A., Mikata, Y.Year:
2001
Language:
english
DOI:
10.1109/issm.2001.963013
File:
PDF, 360 KB
english, 2001