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Long-Range Ordered Self-Assembly of Novel Acrylamide-Based Diblock Copolymers for Nanolithography and Metallic Nanostructure Fabrication
Lee, Je Gwon, Jung, Yeon Sik, Han, Sung-Hwan, Kim, Kwan-Mook, Han, Yang-KyooVolume:
26
Language:
english
Journal:
Advanced Materials
DOI:
10.1002/adma.201305186
Date:
May, 2014
File:
PDF, 4.19 MB
english, 2014