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Characterization and optimization of metal etch processes to minimize charging damage to submicron transistor gate oxide
Lin, M.-R., Fang, P., Heiler, F., Lee, R., Rakkhit, R., Shen, L.Volume:
15
Language:
english
Journal:
IEEE Electron Device Letters
DOI:
10.1109/55.289473
Date:
January, 1994
File:
PDF, 294 KB
english, 1994