High- k Gate Stacks on Low...

ACS Applied Materials & Interfaces 2015 / 01 Vol. 7; Iss. 1

High- k Gate Stacks on Low Bandgap Tensile Strained Ge and GeSn Alloys for Field-Effect Transistors

Wirths, Stephan, Stange, Daniela, Pampillón, Maria-Angela, Tiedemann, Andreas T., Mussler, Gregor, Fox, Alfred, Breuer, Uwe, Baert, Bruno, San Andrés, Enrique, Nguyen, Ngoc D., Hartmann, Jean-Michel,
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Volume:
7
Language:
english
Journal:
ACS Applied Materials & Interfaces
DOI:
10.1021/am5075248
Date:
January, 2015
File:
PDF, 4.27 MB
english, 2015
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