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[IEEE IEEE 29th International Conference on Plasma Sciences - Banff, Alta., Canada (26-30 May 2002)] IEEE Conference Record - Abstracts. 2002 IEEE International Conference on Plasma Science (Cat. No.02CH37340) - Selective and deep etching of SiO/sub 2/ in high density low pressure fluorocarbon plasmas
Gaboriau, F., Cartry, G., Peignon, M.-C., Cardinaud, Ch.Year:
2002
Language:
english
DOI:
10.1109/plasma.2002.1030545
File:
PDF, 93 KB
english, 2002