[IEEE 2006 International Symposium on VLSI Technology, Systems, and Applications - Hsinchu, Taiwan (2006.4.24-2006.4.24)] 2006 International Symposium on VLSI Technology, Systems, and Applications - Tunable Workfunction for Fully Silicied Gates (FUSI) and Proposed Mechanisms
Kim, Y., Cabral, C., Gusev, E., Gignac, L., Gribelyuk, M., Jeong, M.Year:
2006
Language:
english
DOI:
10.1109/vtsa.2006.251094
File:
PDF, 2.34 MB
english, 2006