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[IEEE 2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop - Monterey, CA, USA (2007.08.26-2007.08.30)] 2007 22nd IEEE Non-Volatile Semiconductor Memory Workshop - Self Aligned Trap-Shallow Trench Isolation Scheme for the Reliability of TANOS (TaN/AlO/SiN/Oxide/Si) NAND Flash Memory
Sim, Jae Sung, Park, Jintaek, Kang, Changseok, Jung, Wonseok, Shin, Yoocheol, Kim, Juhyung, Sel, Jongsun, Lee, Changhyun, Jeon, Sanghun, Jeong, Younseok, Park, Youngwoo, Choi, Jungdal, Lee, Won-SeongYear:
2007
Language:
english
DOI:
10.1109/nvsmw.2007.4290602
File:
PDF, 774 KB
english, 2007