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[IEEE 2012 IEEE International Interconnect Technology Conference - IITC - San Jose, CA, USA (2012.06.4-2012.06.6)] 2012 IEEE International Interconnect Technology Conference - Impact of advanced patterning options, 193nm and EUV, on local interconnect performance
Stucchi, Michele, Tokei, Zsolt, Demuynck, Steven, Siew, Yong-KongYear:
2012
Language:
english
DOI:
10.1109/iitc.2012.6251594
File:
PDF, 629 KB
english, 2012