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[IEEE 1998 International Conference on Ion Implantation Technology. Proceedings. Ion Implantation Technology - 98 - Kyoto, Japan (22-26 June 1998)] 1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144) - Al redistribution into SiO/sub 2//Si system during oxidation of high dose Al-implanted silicon
Iacona, F., Raineri, V., La Via, F., Gasparotto, A., Cali, D., Rimini, E.Volume:
1
Year:
1998
Language:
english
DOI:
10.1109/iit.1999.812070
File:
PDF, 478 KB
english, 1998