[IEEE 2008 IEEE International Electron Devices Meeting (IEDM) - San Francisco, CA, USA (2008.12.15-2008.12.17)] 2008 IEEE International Electron Devices Meeting - Conformal doping for FinFETs and precise controllable shallow doping for planar FET manufacturing by a novel B2H6/Helium Self-Regulatory Plasma Doping process
Sasaki, Y., Okashita, K., Nakamoto, K., Kitaoka, T., Mizuno, B., Ogura, M.Year:
2008
Language:
english
DOI:
10.1109/iedm.2008.4796850
File:
PDF, 888 KB
english, 2008