[IEEE 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings - Shanghai, China (2006.10.23-2006.10.26)] 2006 8th International Conference on Solid-State and Integrated Circuit Technology Proceedings - Etching of poly-Si with atomic scale accuracy in inductively coupled Ar and He plasmas
Park, Chang, Yun, Hyung, Kim, Tae, Rhee, Hyong, Shin, Chee, Kima, Sangin, Kim, Chang-kooYear:
2006
Language:
english
DOI:
10.1109/icsict.2006.306312
File:
PDF, 68 KB
english, 2006